Ar+激光激发的LiArA2Ⅱ→X2∑漫射谱发射

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Ar+激光激发的LiArA2Ⅱ→X2∑漫射谱发射

物理学报, 1992, 41(5): 740-743.

DOI: 10.7498/aps.41.740

CSTR: 32037.14.aps.41.740

LiAr A2Π-X2Σ DIFFUSE EMISSION EXCITED BY Ar+ LASER LINES

Acta Phys. Sin., 1992, 41(5): 740-743.

DOI: 10.7498/aps.41.740

CSTR: 32037.14.aps.41.740

摘要

用Ar+的457.9,476.5,496.5,514.5nm激光激发充有Ar气的Li热管,获得Van der Waal's分子LiAr在650—760nm波长范围A2П→X2∑的漫射发射光谱。讨论了产生这种发射的动力学机制。
Abstract
Excited by Ar+ laser lines of 457.9, 476.5,496.5, 514.5nm, the 650-760nm diffuse emission of A2Π-X2Σ lor Van der Waal's molecular LiAr has been observed in a lithium heat-pipe oven with Ar gas. The dynamics of this emission is discussed.
作者及机构信息
张立敏,

魏勋斌,

夏宇兴,

张运生,

耿玉珍,

王辉
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