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中国物理学会期刊

分子束外延生长的赝配高电子迁移率晶体管结构中深能级的研究

CSTR: 32037.14.aps.42.817

DEEP LEVEL STUDIES OF P-HEMT STRUCTURE GROWN BY MBE

CSTR: 32037.14.aps.42.817
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  • 应用深能级瞬态谱(DLTS)技术详细研究分子束外延生长的Pseudomorphic—high electron mobility transistor(P-HEMT)结构中深能级行为。样品的DLTS表明,在P-HEMT结构的n-AlGaAs层里存在着较大浓度(1015-1017cm-3和俘获截面(10-16cm2)的高温电子陷阱。它们直接影响着器件性能。高温电子陷阱的产生可能与AlGaAs层里的氧

     

    The deep levels of P-HEMT structure grown by MBE have been studied using DLTS technique. DLTS Spectra of samples show that high temperature electron traps, having larger capture cross sections and concentrations, are measured in n-AlGaAs layer of P-HEMT structure. These traps may correlate strongly with oxygen content of n-AIGaAs layer and be responsible for electrical parameters of P-HEMT structure. The experimental results also show that DLTS technique may be a tool of optimisation design of practical devices.

     

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