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非晶Nd-Fe薄膜电阻的温度效应与非晶稳定性

物理学报, 1993, 42(5): 840-846.
DOI: 10.7498/aps.42.840
CSTR: 32037.14.aps.42.840

TEMPERATURE DEPENDENCE OF ELECTRIC RESISTIVITY OF Nd-Fe AMORPHOUS THIN FILMS AND ITS THERMAL STABILITY

Acta Phys. Sin., 1993, 42(5): 840-846.
DOI: 10.7498/aps.42.840
CSTR: 32037.14.aps.42.840
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  • 摘要

    用闪光蒸镀法在77K制备了NdxFe1-x(x=0.06-0.80)非晶薄膜,原位测定了其电阻随温度的变化。结果表明:在0.192和ρ(T)∝T。晶化不是在一个固定的温度,而是在一个温度区间发生。

     

    Abstract

    The NdxFe1-x amorphous thin films with x=0.06-0.80 were prepared at 77 K by flash evaporation. The results show that the amorphous films are stable at room temperature when 0.192 and T untill the crystallization occurs. The crystallization of the amorphous films can not be completed at a certain fixed temperature but over a temperature range.

     

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