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中国物理学会期刊

浅杂质注入LEC半绝缘GaAs γ射线辐照缺陷

CSTR: 32037.14.aps.43.1344

γ RADIATION DEFECTS IN SEMI-INSULATING LEC GaAa AFTER SHALLOW IMPURITY IMPLANTATION

CSTR: 32037.14.aps.43.1344
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  • 用深能级瞬态谱(DLTS)和恒温电容瞬态等技术研究了浅杂质注入LEC半绝缘GaAs的γ射线辐照缺陷。在Be-Si共注的LEC半绝缘GaAs中,γ射线辐照引入一电子陷阶E2,并且大大增强了原有的E01(0.298)和E02(0.341)等缺陷,同时明显地瓦解了原有的少子陷阱H03。在单纯注Si的LEC半绝缘GaAs中,γ射线辐阳引进了E'01(0.216),E'02(0.341),E'2,E'4和E'5(0.608)等缺陷。其中E01和E'01是新发现的和γ辐照有关的GaAs缺陷。和低阻衬底同质外延GaAs相比,Be-Si共注LEC半绝缘GaAs具有较低的γ射线辐照缺陷引入率,与此相反,单纯注Si的LEC半绝缘GaAs具有较高的γ射线辐照缺陷的引入率。

     

    The γ radiation defects in shallow impurity implanted semi-insulating LEG GaAs have been studied by the deep level transient spectroscopy (DLTS) and the constant temperature capacitance transient technique. In Si-and Be-coimplanted semi-insulating LEC GaAs, there exists an electron trap E'2 introduced by γ radiation, and both of the two original electron traps E01(0.298) and E02(0.341) are retnarkably enhanced by the radiation, by contrast, the original hole trap Ho3 is greatly reduced. There exist five electron traps,E'01(0.216),E'02(0.341),E'2,E'4 and E'5(0.608), which are caused by γ radiation in Si single-implanted semi-insulating LEC GaAs. The E01 and E'01 are newly observed. by comparison with the GaAs grown epttaxially on a substract of GaAs with low resistivity, Si-and Be-coimplanted semi-insulating LEC GaAs possesses a smaller introduced rate of γ radiation defects, but the Si single-implanted semi-insulating LEC GaAs has a bigger one.

     

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