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中国物理学会期刊

BaF2晶体的取向和入射束的剂量对溅射的影响

CSTR: 32037.14.aps.43.1734

EFFECT OF CRYSTAL ORIENTATION AND INCIDENT ION FLUENCE ON SPUTTERING FROM ION-IRRADIATED BaF2

CSTR: 32037.14.aps.43.1734
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  • 27keV Ar+离子束沿法向分别入射在BaF2单晶(111),(100)和(110)的晶面上,用捕获器方法和Rutherford背散射分析法测定了Ba原子的溅射角分布和溅射产额。结果发现不同取向的晶体表面,它们的溅射产额有明显差异。当用剂量为5×1017ion/cm2的Ar+离子分别轰击这三种晶面时,其溅射产额的顺序Y100>y111>y110.对已被上述剂量辐照过的晶面再作相同剂量轰击时,测得的溅射产额明显增大。这些结果被认为是由于在离子辐照过程中表面晶格受损逐步增大所致。

     

    BaF2 Crystal was irradiated with 27keV Ar+ ions along the normal of (111), (100) and (110) planes at a current density of 1017μA/cm2. Using collector technique and RBS analysis, the angular distribution and yield of Ba atoms sputtered from BaF2 crystal have been measured as a fuction of orientation and ion fluence. The obtained angular distributions of Ba atoms sputtered are over-cosine type for all specimens. The sputtering yields were strongly dependent on the fluence of the incident beam on the targets

     

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