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中国物理学会期刊

n型碲镉汞MIS器件动态存储时间研究

CSTR: 32037.14.aps.43.1883

DYNAMIC STORAGE TIME MEASUREMENTS OF N-TYPE Hg1-xCdxTe METAL-INSULATOR-SEMICONDUCTOR DEVICES

CSTR: 32037.14.aps.43.1883
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  • 通过对动态存储时间的测量,分析了x=0.31的n型碲镉汞(H1-xCdxTe)MIS器件的少子暗电流机理.理论计算和实验结果都表明,在其工作温度区域(~77K),通过禁带中深能级中心辅助的间接隧道电流将限制器件的电学性能。

     

    Dynamic storage time has been measured for x=0.31 n-type Hg1-xCdxTe metal-insulator semiconductor (MIS) devices over temperature range of 68 to 250K. The theoretical calculations have been made in analysing the mechanisms of dark currents. The results point out that the indirect tunnel current, which involves a thermal transition of an electron from the valence band to a band-gap state followed by tunneling into the conduction band, is the main dark current source, especially in low-temperature (about 77K) high-field regime and will dominate the electrical properties of the MIS devices.

     

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