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中国物理学会期刊

脉冲红外激光诱发SiH4+CH4解离动力学研究

CSTR: 32037.14.aps.43.1889

A STUDY ON DISSOCIATION KINETICS OF SiH4+CH4 PLASMA INDUCED BY PULSED INFRARED LASER

CSTR: 32037.14.aps.43.1889
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  • 采用光学发射谱(OES)技术对脉冲TEA CO2激光诱发SiH4+CH4系统击穿产生的等离子体辐射进行了时间分辨的光谱测量。结果表明等离子体内分子的各碎片发光均在气体击穿时刻开始出现,但具有不同的时间特性,由此探讨了气体分子的分解过程。分析结果支持激光诱发SiH4+CH4等离子体内的主要离解通道为产生Si,C原子通道的分解动力学机制的解释。据此观点讨论了气体分解碎片间的反应过程。实验与理论符合较好。

     

    The time-resolve optical emission spectroscopy is used to study silane and methane laser plasma. The results show that the different fragments' characteristic lines has the same appearance time but different temporal behaviours when the reactant breaks down. Based on the experimental results of dissociation processes it is suggested that the producing of Si and C atoms is the main dissociation channels of the reaction.

     

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