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中国物理学会期刊

铁电薄膜底电极对薄膜结构与电性能的影响

CSTR: 32037.14.aps.43.1932

EFFECT OF THE BOTTOM ELECTRODES ON THE STRUCTURE AND ELECTRIC PROPERTIES OF FERROELECTRIC THIN FILMS

CSTR: 32037.14.aps.43.1932
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  • 研究了电极材料(Pt/Ti)对铁电PLZT(7.5/65/35)陶瓷薄膜结构和性能的影响.认为在Pt层厚度一定时,Ti层的厚度对铁电薄膜的结构和性能有显著影响.当Ti层过厚或过薄时,铁电薄膜的结构较差;而当Ti层的厚度适中时,则铁电薄膜的显向下微结构均匀,电性能较好,典型的剩余极化强度和矫顽场分别为27.8μC·cm-2和65.1kV·cm-1.

     

    The effect of electrode materials on the structure and electric properties of ferroelectric PLZT(7.5/65/35) ceramic thin films has been investigated. It has been shown that, for a certain thickness of the Pt layer, the thickness of the Ti layer has a dominant effect on the structure and electric properties of the ferroele-ctric thin films. When the Ti layer was too thick or too thin, PUT thin films had undesireable crystalline structure. However, with appropriate thickness of the Ti layer, ferroelectric thin films of good microstructure and electric properties be obtained, with typical remanent polarization 27.8μ C·cm-2,and coercive field 65.1kV·cm-1,respectively.

     

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