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中国物理学会期刊

a-Si3N4纳米粒子的激光法制备及能级结构研究

CSTR: 32037.14.aps.43.627

A STUDY ON LASER-PREPARATION AND ENERGY- LEVEL STRUCTURE OF NANOMETER SIZED a-Si3N4 PARTICLES

CSTR: 32037.14.aps.43.627
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  • 给出激光化学汽相沉积法制备a-Si3N4纳米粒子的原理和经验公式,在特定工艺参数下获得平均粒径为6.5nm的优质a-Si3N4纳米粒子,用紫外光谱研究其能级结构,发现与小粒子有关的峰状光谱结构和能带分裂现象,描述了a-Si3N4纳米粒子的物理结构图象,确认硅错键≡Si—Si≡,硅悬挂键≡Si30在富硅a-Si3

     

    In this paper, we give the principle and the empirical formulas of the preparation for nanometer sized a-Si3N4 particles by laser induced chemical vapor deposition (LICVD). Under certain technological parameters, our experiments have obtained high quality nanometer a-Si3N4 particles whose average diameter is 6.5nm. We disperse these particles in organic solvent so as to study its energy level structure with ultravolet-visible spectrum. The photoluminescent experiments show its peak-like spectrum structure and the splitting of energy band, which relate to super micro-particles. We also describe the picture of the physical structure of nanometer a-Si3N4 particles and demonstrate that silicon"wrong bond"≡Si-Si≡and silicon dangling bond≡Si30 play a dominant role in the spectrum character for Si-riched nanometer a-Si3N4 particle.

     

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