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中国物理学会期刊

由低温退火轻掺杂控制a-Si:H膜的固相晶化成核

CSTR: 32037.14.aps.43.966

NUCLEATION MECHANISM OF THE SOLID PHASE CRY STALLIZATION OF a-Si:H FILMS CONTROLLED BY LIGHTLY DOPING IN LOW-TEMPE-RATURE ANNEALING

CSTR: 32037.14.aps.43.966
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  • 通过低温退火工艺以实现a-Si:H膜的局部n型轻掺杂,控制了固相晶化过程中的成核中心密度,获得了较大晶粒的良质多晶硅膜。有关测试结果表明:晶化过程是较均衡地沿(111),(220),(311)晶向进行,而按(111)晶向择优取向,测得晶粒粒径≈1μm,迁移率≈92.7cm2/V·s,室温暗电导率在10-2—10-4s/cm之间,在800—1000nm波段的吸收系数为104cm-1的数量级,相应的吸

     

    By lightly doping in a-Si: H films in the process of low-temperature annealing, the density of the nualeation centers was controlled, and the films of larger grain polysilicon with good quality were obtained. The results show that the crystallization was almost uniformly proceed in(, and direction (slightly faster in direction), the average grain size is about 1μm, the mobility is about 92 cm2/V·s, and the dark conductivity at room-temperature is between 10-2s/cm and 10-4s/cm. The optical gaps of the crystallized films were determined between 1.16-1.22eV from the absorption spectrum. The coefficient of optical absorption within the wave length range of 800-1000nm is on the order of 104cm-1, and the absorption efficiency is around 60%.The results of heavily doped annealing samples of a-Si:H, as a contrast, are also discussed.

     

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