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分析了Si(111)7×7表面上Na(3×1)有序吸附的同步辐射光电子能谱的变化,并与Paggel等的扫描隧道显微镜和光电子能谱比较,得出Na吸附在类余留原子(rest atom)的位置,支持Mnch的模型,与室温下无序吸附Na的光电子能谱相比较,得出Na-Si界面肖特基势垒形成是由Na与Si原子之间的相互作用决定,与表面构形是否有序关系不大,势垒高度与MIGS理论预计值相符。The photoemission spectra with a sychrotron radiation of (3×1) Na adsorbed orderly and disor-derly on Si(lll)-7×7 surface are analyzed and compared with the spectra of clean Si(lll)-7×7 surface. Na atoms are not simply adsorbed on the adatoms or rest atoms. The formation of the Schot-tky barrier is decided by the interaction between Na and Si atoms and seem to bear no relation to the surface structure. The Schottky barrier height(SBH) from experimental data is agreement with the value estimated by MIGS theory.







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