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中国物理学会期刊

Ni/NiO界面的高场磁化研究

CSTR: 32037.14.aps.45.140

APPROCHING TO SATURATION OF Ni/NiO INTERFACE

CSTR: 32037.14.aps.45.140
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  • 报道在表面包覆NiO的Ni超微颗粒和Ni/NiO多层膜中Ni/NiO界面的磁性实验结果.在T<80K下Ni/NiO界面存在较大的磁化强度(H=40kOe),并随温度上升而快速下降.对高场磁化(5-65kOe)实验数据进行拟合,结果表明Ni/NiO界面存在类似磁矩排列不一致的结构.

     

    The magnetic properties investigated by experiment on the Ni/NiO interface of Ni/NiO multi-thin layers and surface-NiO-coated Ni ultra fine particles are reported. At temperatures below 80 K, an abnormal enhanced magnetization under external magnetic field (H = 40kOe) was found. The enhanced magnetization decreases quickly with temperature increasing.The high field (5-65 kOe) magnetization (approching to saturation) of ultrafine particles and multi-thin layers were also measured. The fit results for experimental data indicate that the interface Ni/NiO in Ni/NiO UFP and Ni/NiO ML have inhomogenous spin structure.

     

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