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采用包络函数方法对生长在Ge0.3Si0.7(001)衬底上势垒区δ掺杂量子阱Ge0.3Si0.7/Si/Ge0.3Si0.7的电子能带结构及子带间光吸收特性进行了自洽的计算.对光吸收系数与量子阱的阱宽、δ掺杂位置及δ掺杂密度间的变化关系进行了讨论.最后对由高浓度的二维电子气的退极化效应所引起的频率位移进行了研究The electronic structures and intersubband absorption coefficients of Ge0.3Si0.7/Si/Ge0.3Si0.7 quantum wells with barrier-δ-doping grown on Ge0.3Si0.7(001) substrates are consistently calculated in the envelopefunction approach. The dependences of the absorptivities on the well widths, δ-doping position and δ-doping concentration are discussed . At last, the frequency shift caused by the depolarization effects of highly dense two-dimensional electrons are studied.







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