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中国物理学会期刊

富勒烯薄膜上二维金属渗流系统的电击穿现象

CSTR: 32037.14.aps.45.1905

ELECTRIC BREAKDOWN OF PERCOLATION SYSTEM OF 2D METAL FILM ON FULLERENE UNDERLAYER

CSTR: 32037.14.aps.45.1905
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  • 富勒烯(C60和C70)薄膜可外延生长在新鲜解理的云母(001)平面.以这富勒烯层为衬底,将金属薄膜蒸镀在其上,便构成典型的二维渗流系统.蒸镀过程在超高真空系统中完成,并同时对样品的电阻特性进行原位测量.随着外加电压的增加,观测到样品电阻可逆的变化现象与不可逆的电击穿现象.在渗流阈值附近,击穿电流Ib与样品电阻R之间表现出幂指数关系:Ib~R-α.指数α比前人实验给出的数值和Nodes-Links-Blobs模型的预期值小得多,而且随着衬底材料的不同而不同.基于金属和富勒烯界面相互作用的理论,对这些现象作了解释

     

    Fullerene (C60 and C70)films were epitaxially grown on fresh (001) mica fcc closely-packed plane parallel to the substrate surface. Metal-overlayers were deposited onto these fullerene films in an ultra-hight-vacuum(UHV) chamber and in situ resistance measurements were performed. With increasing current, we observed reversible resistance variation and irreversible breakdown. Nera the percolation threshold we find power law scaling behavior Ib~R-α,where Ib is breakdown current and R the sample resistance. The exponent α is much smaller than the values given by previous experiments and prediction of conventional Nodes-Links-Blobs(NLB) model. Possible explanation of these phenomena based on metal-fullerene interfacial interactions is discussed.

     

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