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中国物理学会期刊

Pd,Ge薄膜体系中的分形晶化行为

CSTR: 32037.14.aps.45.94

BEHAVIOUR OF THE FRACTAL CRYSTALLIZATION IN Pd, Ge THIN FILM SYSTEM

CSTR: 32037.14.aps.45.94
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  • 利用透射电子显微镜(TEM)对有化合物生成(Pd2Ge和PdGe等)的Pd,Ge薄膜体系中的分形晶化行为进行了系统研究实验结果和分析表明:在各种退火温度条件下,Pd-Ge共蒸膜都难以发生分形晶化,Pd/a-Ge双层膜较a-Ge/Pd双层膜更容易导致分形结构的产生Z化合物Pd2Ge和PdGe的形成对薄膜中的分形晶化有明显的抑制作用,体系中能否出现分形结构,取决于非晶Ge的成核生长和Pd,Ge化学反应两种过程的相互竟争.

     

    The behaviour of the fractal crystallization in Pd, Ge thin film system of various ratios of thickness (or composition) after annealing have been investigated by transmission electron microscopy (TEM). It was difficult for the coevaporated Pd-Ge films to realize the fractal crystallization. The production of the fractal structure in Pd/a-Ge bilayers was easier than that in a-Ge/Pd bilayers. The fractal crystallizations were restrainted because of the formation of the compounds (Pd2Ge and PdGe) in Pd, Ge bilayers. The growting of the fractal struc ture depends on the competition of the two precesses of a-Ge crystallization and compound formation.

     

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