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中国物理学会期刊

对单晶硅里双碳中心经退火后的光谱研究

CSTR: 32037.14.aps.45.995

OPTICAL SPECTRA OF DI-CARBON CENTER AFTER ANNEALING IN SILICON MONOCRYSTAL

CSTR: 32037.14.aps.45.995
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  • 对区熔和直拉单晶硅中双碳中心的热退火行为进行研究,并观测到新的硅光致发光谱线。这些谱线与硅中的碳、氧等点缺陷有关。实验已发现,双碳中心化学键断裂不是双碳中心退化的唯一原因,其他缺陷也会产生影响。我们认为双碳中心位于951.16(7671),952.98(7686),956.91meV(7717cm-1的子带谱线是由于间隙硅原子而不是由空位造成的。

     

    We've investigated the annealing behaviour of the di-carbon centre (zero-phonon line at 969 meV or 7818 cm-1)in float zone and Czochralski silicon crystals. The break-up process is not the only way to destroy the di-carbon centres and it is shown that the presence of other defects may affect the annealing process. After the thermal destruction of the di-carbon centre, we've discovered many previously unreported carbon and oxygen related point defects. Their photolumiescence lines are observed. We suggest that the interstitial silicon atom is the defect trapped near but not ‘at' the di-carbon centre forming the satellite sublines at 951.16(7671), 952.98(7686), and 956.91meV (7717cm-1).

     

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