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中国物理学会期刊

不同邻晶面Hg1-xCdxTe外延薄膜的特性分析

CSTR: 32037.14.aps.46.1168

CHARACTERIZATION OF Hg1-xCdxTe EPITAXIAL FILMS ON VARIOUS VICINAL PLANES

CSTR: 32037.14.aps.46.1168
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  • 在取向不同的CdTe衬底上用液相外延技术生长了Hg1-xCdxTe薄膜,结合金相显微镜、红外显微镜、X射线双晶衍射、红外吸收及Raman光谱等手段分析了不同邻晶面外延层的性质,结果表明,在“近平面”(衬底偏角δ<0.1°)或“无台阶面”(δ≈1.2°)上生长的外延层的晶格质量及光学性能较好

     

    The Hg1-xCdxTe films were prepared by a dipping liquid phase epitaxy technique on spherical CdTe substrate with several different misoriented facets. They were characterized by means of micrograph,infrared absorption spectra, Raman scattering, and X ray double crystal diffraction. The results show that-near facet (δ<1°) and terrace free (δ≈1.2 °) growth modes are superior in both the planarity and the amount of precipitates.

     

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