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中国物理学会期刊

GaAs(100)衬底上C60单晶膜的取向生长

CSTR: 32037.14.aps.46.481

THE ORIENTED GROWTH OF C60 FILMS-ON GaAs(100) SUBSTRATE

CSTR: 32037.14.aps.46.481
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  • 利用双温区真空蒸发沉积技术成功地在GaAs(100)衬底上实现了完全(111)取向的C60单晶膜的生长.用扫描电子显微镜和X射线衍射技术对C60单晶膜的形貌和结构进行了分析.结果表明:能实现C60取向生长的衬底温度范围很窄,温度过高或过低都易造成晶粒的取向无序.对实验结果做出了合理的解释,并讨论了C60单晶膜的生长机制

     

    Entirely (111) oriented C60 single films are grown successfully on GaAs (100) substrate by a physical vapor deposition technique with double temperature zone.The structure and morphology of films are studied by X-ray diffraction and SEM.The results show that the highly oriented growth of C60 films occurs only at narrow range of substrate temperature,higher or lower substrate temperature leads to random orientation of grains.A reasonable explanation for experimental results is given and the growth mechanism of C60 epitaxial films is discussed.

     

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