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中国物理学会期刊

GaS/GaAs界面电学性质研究

CSTR: 32037.14.aps.46.612

STUDIES OF ELECTRONIC PROPERTIES OF GaS/GaAs INTERFACE

CSTR: 32037.14.aps.46.612
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  • 报道了微波放电法在GaAs表面生长GaS薄膜.用电容电压法(C-V)、伏安法(I-V)以及深能级瞬态谱(DLTS)等测试手段对GaS/GaAs界面的电学性质进行了研究.GaS/GaAs界面的CV特性反映此处的界面特性比较好,界面态密度约为1012/(cm2·eV).DLTS的测试得到了与其一致的结果.另外,从I-V曲线中漏电流的大小,估算出GaS的电阻率为1011Ω·cm

     

    A novel passivation film on GaAs surface has been grown by microwave sulfur glow discharge technique.Electronic properties of GaS/GaAs interface have been studied by C-V,I-V, and DLTS measurements.C-V measurement shows that the properties of GaS/GaAs interface are nearly ideal and interface state density is about 1012/(cm2·eV),which agrees with result from DLTS measurement.From leak current of MIS′s structure in I-V spectra,the resistivity of GaS is estimated about 1011Ω·cm.

     

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