Diamond films were alternatively deposited on alumina ceramic wafers by microwave plasma chemical vapor deposition (MPCVD) and hot-filament chemical vapor deposition (MPCVD).The qualities of the deposited diamond films deposited on different wafers with different deposited techniques were appraised by the method of fitting the spectra, and the domain size and strain of the films were calculated.The results of calculation were consistence with that derived from the X-ray diffraction analyses.