The admittance spectroscopy technique has been used to study the hole confinement in Si/Si1-xGex/Si and boron highly doped superthin Si quantum wells. Based on the carrier thermal emission medel of the carriers in the well, the value of activation energy derived from the admittance spectra was considered as the distance from the position of the heavy hole ground state in the well to the top of it . For Si/Si1-xGex/Si quantum wells we found the value of activation energy increased with increasing annealing time at 800℃. The phenomena could be explained the annealing-induced interdiffusion of Si and Ge, the interface broadening, the weakening of quantum confinement, the decrease of the position of the heavy hole ground state, and so the increase of the activation energy. At the annealing temperature of 900℃, we only see the decrease of the value of activation energy with increasing annealing time. For boron highly doped superthin Si quantum wells due to quantum confinement effect, we observed the activation energy are different for samples with the same doping density but different well widths.