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中国物理学会期刊

赝配GaAs/In0.2Ga0.8As量子阱导带不连续量的C-V和电容瞬态测量

CSTR: 32037.14.aps.47.1339

CONDUCTION-BAND OFFSET IN PSEUDOMORPHIC GaAs/In0.2Ga0.8As QUANTUM WELL DETERMINED BY C-V PROFILING AND DLTS TECHNIQUES

CSTR: 32037.14.aps.47.1339
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  • 分别采用二种不同方法测量分子束外延(MBE)生长GaAs/In0.2Ga0.8As单量子阱结构的导带不连续量ΔEc:1) 考虑样品界面电荷修正的电容-电压(C-V)分布;2) 量子阱载流子热发射产生的电容瞬态(DLTS).C-V测得的ΔEc=0.227eV,大约相当于89% ΔEg.DLTS测得的ΔEc=0.229eV,大约相当于89.9% ΔEg.结果

     

    The conduction-band offset ΔEc has been determined for molecular beam epitaxy (MBE) grown GaAs/In0.2Ga0.8As single quantum well structure,by measuring the capacitance-voltage profiling, while taking into account a correction for the interface charge density, and the capacitance transient resulting from thermal emission of carrier from the quantum well, respectively.We found that ΔEc=0.227eV,corresponding to about 89% ΔEg,from the C-V profiling; and ΔEc=0.229eV, corresponding to about 89.9% ΔEg, from the deep level transient spectroscopy (DLTS) technique. The results suggest that the conduction-band discontinuity ΔEc obtained from the C-V profiling is in good agreement with that obtained from the DLTS technique.

     

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