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中国物理学会期刊

金属-绝缘体-金属隧道发光结的电子隧穿和负阻现象

CSTR: 32037.14.aps.47.300

ELECTRON TUNNELING AND NEGATIVE DIFFERENTIAL RESISTANCE OF MIM LIGHT-EMISSION TUNNEL JUNCTION

CSTR: 32037.14.aps.47.300
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  • 薄膜Au-Al2O3-Al隧道结(MIMTJ)在产生可见光发射的同时表现出了明显的负阻现象.这种负阻现象的物理机制是由于结中产生了作为发光中介作用的表面等离极化激元(SPP)对隧穿电子的阻挡作用.通过MIMTJ的电子输运的电路模拟和I-V特性的数值计算,揭示了SPP在I-V特性曲线中的负阻、隧道结发光中所起的关键作用.

     

    We have observed that the apparent negative differential resistance(NDR) comes out in I-V characteristic curves of metal-insulator-metal(MIM) thin film tunnel junction when light-emission from this structure occurs in the experiments.The mechanism of this NDR is that the surface plasmon polariton(SPP),which plays a role of intermediate in the process of light-emission,creates the impeding effect upon tunneling electrons.We have also built the circuit simulation of electron-transfer, computed the numerical solution of I-V characteristic curve,and revealed the key action of SPP on the NDR in I-V characteristic curve and the light-emission from MIM tunnel junction.

     

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