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中国物理学会期刊

纳米硅薄膜的光致发光特性

CSTR: 32037.14.aps.47.864

PHOTOLUMINESCENCE STUDY ON HYDROGENATED NANO-CRYSTALLINE SILICON FILM

CSTR: 32037.14.aps.47.864
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  • 用等离子体增强化学汽相淀积法系统制备了发光纳米硅(nc-Si∶H)薄膜.讨论了晶粒尺寸和表面结构对光致发光(PL)谱的影响.用量子限制-发光中心模型解释了nc-Si∶H的PL.研究了PL谱的温度特性.温度从10K上升到250K,PL峰值红移了54meV,且PL强度衰减了两个数量级.

     

    Light-emitting hydrogenated nano-crystalline silicon (nc-Si∶H) films have been fabricated using plasma-enhanced chemical-vapor deposition method.It was found that photoluminescence(PL) properties are directly related to grain size and surface strucuture.The quantum size effect and surface states model was proposed to explain PL.Meanwhile,temperature dependence of PL peak energy and integrated intensity are also studied.The former is mainly caused by band-gap shrinkage and the PL intensity decrease with increasing temperature can be interpreted using a temperature independent radiative term and a temperature-dependent thermally activated non-radiative one.

     

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