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中国物理学会期刊

自组织InAs/GaAs量子点垂直排列生长研究

CSTR: 32037.14.aps.47.89

STUDY OF VERTICALLY ALIGNING GROWTH OF SELF-ASSEMBLED InAs/GaAs QUANTUM DOTS

CSTR: 32037.14.aps.47.89
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  • 利用自组织生长InAs/GaAs量子点的垂直相关排列机制,生长了上下两层用6.5nm GaAs间隔的InAs结构.下层InAs已经成岛,由于应力传递效应,上层InAs由二维生长向三维成岛生长的转变提前发生,临界厚度从1.7ML变成小于1.5ML.透射电子显微镜截面象显示形成上下两层高度差别很大的InAs量子点,但是由于两层量子点之间存在强烈的电子耦合,光致发光谱中只有与包含大量子点的InAs层相对应的一个发光峰.

     

    We have grown two-layer InAs structures spaced by 6.5nm GaAs. Self-assembled InAs quantum dots (QDs) occur in the first layer with 2.5ML InAs coverage due to S-K growth mode. The second layer changes from 2D to 3D growth when the thickness of InAs is 1.5ML, which is obviously smaller than the critical thickness (1.7ML) of single InAs layer structures. Transmission electron microscopy shows that two-layer QDs with different heights have been obtained according to the mechanism of a vertically correlated arrangement. But only one photoluminescence peak related with large QD ensemble has been observed as a result of strong electronic coupling in InAs QD pairs.

     

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