搜索

x
中国物理学会期刊

硅量子点中电子的荷电动力学特征

CSTR: 32037.14.aps.49.2037

CHARGING DYNAMICS OF Si-QUANTUM DOTS IN TUNNEL CAPACITOR

CSTR: 32037.14.aps.49.2037
PDF
导出引用
  • 利用频率依赖电容谱的测量,对于SiO2/硅量子点/SiO2/硅衬底隧 穿电容中硅量子点的荷电特征进行了研究.由于量子点的极小尺寸和良好的均匀性,室温下 在强反型区成功地观察到了与单电子隧穿相关的两个电容和电导共振峰,它们分别对应于硅 衬底导带上的电子与量子点中第一与第二个基态之间直接隧穿过程.实验数据分析给出了量 子点中的库仑荷电能,并进行了讨论.

     

    Using frequency-dependent capacitance spectroscopy, we investigate the charging dynamics of silicon quantum dots embedded in oxide matrix through a SiO2/Si-quantum dots/SiO2/Si-substrate tunnel capacitor. Two resonance peaks both for capacitance and conductance in the inversion region are observed at room temperature, being attributed to the direct tunneling between the condu ctance band ofSi-substrate and the one-and two-electron ground-state level of th e Si quantum dot. The Coulomb charging energy of the dots is extracted from the experimental results.

     

    目录

    /

    返回文章
    返回