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中国物理学会期刊

射频溅射微晶NiOxHy膜电致变色性能及其机理研究

CSTR: 32037.14.aps.49.2066

STUDY ON ELECTROCHROMIC PERFORMANCES AND MECHANISM OF MICROCRYSTAL NiOxHy THIN FILMS FABRICATED BY R.F.DEPOSITION

CSTR: 32037.14.aps.49.2066
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  • 研究了射频溅射制备的NiOx膜的电致变色性能,发现富氧非理想化学配比的NiO x(x>1)膜具有变色活性,这种膜出现Ni3+和Ni2+的混 合价态,当H+注入并占据Ni空位时,导致Ni3+的t2g 能级被填满,Ni3+被阴极还原为Ni2+引起光学透明,即为漂白态; 反之,H+被萃取出NiO

     

    In this article,the electrochromic (EC) properties of R.F.deposited NiOx thin films are investigated.It was found that non-stoichiometric NiOx(x>1) thin films which are rich in O element have EC activation.In NiOx thin films exist both Ni3+ and Ni2+ ions.The insert ion of H+ ions and their sequential occupation of Ni vacation render t2g energy levels of Ni3+ ions completely filled.Thus,Ni3+ is reduce to Ni2+ ions and the NiOx films get light transparent.On the contrary,the extraction of H+ ions from NiO x films will produce vacancies in the t2g energy levels o f Ni2+.Ni2+ ions are oxidized to Ni3+ ions,wh ich makes NiOx films absorb light.The film is then colored.

     

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