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中国物理学会期刊

KTN薄膜脉冲激光沉积过程的机理研究

CSTR: 32037.14.aps.50.1950

STUDY ON THE MECHANISM OF THE DEPOSITON PROCESS OF KTN THIN FILM BY PULSED LASER

CSTR: 32037.14.aps.50.1950
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  • 根据能量平衡原理,导出了脉冲激光作用靶材的烧蚀率公式,并根据流体动力学理论,得出了脉冲激光产生的等离子体的空间运动特性方程,将靶材烧蚀率公式与等离子体空间动力学方程结合起来,根据实验研究了不同激光功率密度和波长对Kta0.65Nb0.35O3(KTN)薄膜沉积特性的影响,得到了一些有价值的结果,并对结果进行了详细的讨论,理论计算结果与实验大体符合.

     

    According to energy balance consideration, the ablation ratio formula of target irradiated by pulsed laser is derived, and the spatial-characteristic equations of plasma generated by pulsed laser are obtained by using fluid dynamic theory. Combining the ablation ratio formula with the spatial-characteristic equations of plasma, the effects of different laser power density and wavelength on the deposition characteristics of Kta0.65Nb0.35O3(KTN) thin film are studied on the basis of our experiments. And many valuable results are obtained which have been discussed in detail. The calculated results are in agreement with experiments on the whole.

     

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