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中国物理学会期刊

共溅射和离子注入制备的SiO2(Eu)薄膜中Eu3+到Eu2+的转变

CSTR: 32037.14.aps.50.532

THE TRANSITION FROM Eu3+TO Eu2+ IN SiO2(Eu) THIN FILMS PREPARED BY ION IMPLANTATION AND CO-SPUTTERING

CSTR: 32037.14.aps.50.532
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  • 采用共溅射方法和Eu离子注入热生长的SiO2方法得到SiO2(Eu)薄膜,Eu离子的浓度为4%和0.5%.对样品X射线吸收近边结构(XANES)的研究和分析表明,在高温氮气中发生了Eu3+向Eu2+的转变.SiO2(Eu)薄膜高温氮气退火下蓝光的发射证明了这一结论

     

    Eu ions doped SiO2 thin films, SiO2(Eu), were prepared by co-sputtering of SiO2 and Eu2O3 and Eu ion implantation into thermally grown SiO2 films. The Eu-L3-edge X-ray absorption near edge structure (XANES) spectra of SiO2(Eu) films show a doublet absorption peak structure with energy difference of 7 eV, which indicates the conversion of Eu3+ to Eu2+ at-high annealing temperature in N2. The strong blue luminescence of SiO2(Eu) films prepared by ions implantation after films annealed above 1100 ℃ confirms the above argument.

     

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