VoltagetransientsduetothethermalelectroncaptureandemissionofDXcentersinn typeSn dopedAl0 . 2 6 Ga0 .74Aswere
measuredbytheconstantcapacitancetechniqueandtransformedbyLaplacedefectspectroscopy (LDS) .Byanalyzingthevariationsofdiscreteemissionrateswithdifferentcaptureperiods,correspondingrelationsbetweendiscretecaptureandemissionratesandcapturecoefficientsweredetermined .ThefinestructuresofelectroncapturebarriersoftheSn relatedDXcenterswereobtainedbylinearfittingthedataoftemperature dependencesofthecapturecoefficients.TheresultscalcuatedbyusingthefirstprinciplepseudopotentialmethodshowthatthefinestructuresofthecapturebarriersmainlycontributetoAl GaatdifferentlocalconfigurationsnearSnatomsduetothealloyrandomeffect.