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中国物理学会期刊

CVD金刚石膜的结构分析

CSTR: 32037.14.aps.52.1479

Microscopic structure studies on the diamond films fabricated by chemical vapor deposition method

CSTR: 32037.14.aps.52.1479
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  • 利用x射线广角衍射和低角掠入射散射谱、正电子湮没谱、定性分析软件和Positronfit程序,研究了生长在Si(100)基底上的金刚石膜微结构.研究发现,在样品邻近基底区域为纳米 多晶结构,具有弱的[111]织构;在邻近表面区域为微米多晶结构,具有强的[220]织构 .金刚石膜样品有空位、空位团和空洞3种缺陷,其中主要缺陷是大约10个空位形成的空位团 .

     

    The microscopic structures of the diamond films generated on Si (100) substrates by chemical vapor deposition have been studied by x-ray wide angle diffraction spectroscopy, grazing incidence x-ray scattering spectra, positrons annihilation lifetime spectroscopy, and qualitative software and Positronfit program. The di ffraction x-ray spectra show a structure difference between the near substrate p art (NSP) and near free-surface part (NFP) of the diamond film specimens, which reflect the weak [111]texture in NSP and the strong[220] texture in NFP. The positron annihilation lifetime spectroscopy of the specirnens and the analyzing data indicate that the majority of positrons annihilate around 200 ps and 400 p s. The vacancies, vacancy clusters, and voids were found in the film specimens, depending on the processes in which the chemical vapor deposition is generated.

     

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