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中国物理学会期刊

不同衬底上的ZnO薄膜紫外光致发光

CSTR: 32037.14.aps.52.1484

Ultra violet photoluminescenc of ZnO films on different substrates

CSTR: 32037.14.aps.52.1484
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  • 用射频磁控溅射法在蓝宝石、硅和石英衬底上沉积出具有好的择优取向的多晶ZnO薄膜. 在270 nm波长的光激发下室温下可观察到显著的紫外光发射(波长为356 nm)和较弱的蓝光发射(波长为446 nm). 经高温退火后薄膜的结晶质量显著提高, 在蓝宝石、石英衬底上沉积的薄膜,其积分发光强度分别增加了7倍和14倍.而硅衬底上的膜发光强度增强不太显著.紫外光发射源于电子的带间跃迁,而蓝光发射是由电子从氧空位浅施主能级到价带顶的跃迁引起的.

     

    Polycrystalline ZnO films with a good preferred orientation were deposited on sapphire, Si and quartz substrates by rf magnetron sputtering. A 356 nm Ultraviolet (UV) photoluminescence (PL) peak and a 446 nm blue peak were observed at room temperature when excited with 270 nm light. After high-temperature annealing in oxygen, the crystallinity of the films was improved. The intensity of the UV emission increased by 7 and 14 times, respectively, for the films on sapphire and quartz substrates respectively. We conclude that the UV emission originates from the inter-band transition of electrons and the blue emission is due to the transition of electrons from the shallow donor level of the oxygen vacancies to the valence band.

     

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