The Fourier transform infrared (FTIR) spectrum is an effective technology for studying the hydrogen content (CH) and the silicon-hydrogen bonding configuration (Si-Hn) of hydrogenated amorphous silicon (a-Si∶H) films. In this paper, CH and Si-Hn of a-Si∶H films, fabricated at different substrate temperatures (Ts) by plasma enhanced chemical vapor deposition method, have been obtained by analyzing their FTIR spectra that are treated by baseline fitting and Gaussian function fitting. The effects of Ts on CH and Si-Hn are studied.