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中国物理学会期刊

非平衡磁控溅射沉积系统伏安特性模型研究

CSTR: 32037.14.aps.53.1994

Investigation of the model of the discharge properties of the unbalanced magnetron sputtering system

CSTR: 32037.14.aps.53.1994
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  • 非平衡磁控溅射沉积系统的伏安特性对阴极溅射和薄膜沉积过程具有重要的影响.通过分析在常规磁控溅射沉积系统中非平衡磁场对于放电过程的影响,根据蔡尔得定律研究了非平衡磁场对磁控溅射沉积系统伏安特性影响的基本规律;根据模型和实验数据的对比证明模型正确表达了非平衡磁控溅射沉积系统中非平衡磁场对伏安特性影响的规律.

     

    The voltage current property of the unbalanced magnetron sputtering (UMS) system has significant influence on the sputtering process and films deposition process. Based on the analysis of the relationship between unbalanced magnetic field and properties of the unbalanced magnetron sputtering system, according to Child law the model of the V-I property of the UMS system is set up. Comparisons between the model calculation results and the experimental data indicate that the model correctly expresses the relation between the unbalanced magnetic field and the discharge properties of the UMS system.

     

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