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中国物理学会期刊

Mg掺杂对AlGaN薄膜特性的影响

CSTR: 32037.14.aps.53.3587

Effect of Mg doping on properties of AlGaN films

CSTR: 32037.14.aps.53.3587
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  • 利用高精度x射线衍射和拉曼散射光谱,对MOCVD生长的不同Mg掺杂量的AlGaN薄膜的c轴 晶格常数、摇摆曲线和拉曼频移进行测量发现:当Mg掺杂剂量较小时,E2模式向 低频方向漂移表明张力应力有所增加,但是摇摆曲线和A1(LO)模式半高宽减小表 明薄膜质量有所提高;随着Mg掺杂剂量的增加,E2模式反向漂移表明此时薄膜中 存在压力应力,同时薄膜质量有所下降.最后根据拉曼频移和应力改变进行拟合得出相应的 线性表达式为Δσ=-0298+0562·ΔE.

     

    Effect of Mg doping on the properties of AlGaN layers gro wn on sapphire substrates by metal_organic chemical vapor deposition were studie d using x_ray diffraction and Raman scattering. When the doping of Mg was low, the E2 mode shifted to lower frequency and the full width half at maximum of the rocking curve and A1(LO) mode decreased. However, as the flow rate of CP2Mg increased ti ll the AlGaN was doped with a dose as high as 4×102/sup>cm-3, the quali ty of film de creased gradually and the E2mode shifted to higher frequency, indicat ing a compressive stress in the films. Finally, the relation between the Raman s hift and the stress alteration was described by Δσ=-0298+0562ΔE.

     

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