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中国物理学会期刊

溅射功率对Fe-Si-B-Nb-Cu薄膜微结构与磁性的影响

CSTR: 32037.14.aps.53.3614

Influence of rf power on the microstructure and magnetic properties of Fe-Si-B-Nb-Cu thin films

CSTR: 32037.14.aps.53.3614
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  • 通过射频磁控溅射法制备了Fe_Si_B_Nb_Cu薄膜,采用x射线衍射与Mssb auer谱相结合分析了薄膜的微结构形态,研究了不同溅射功率对薄膜微结构的影响.其结果 表明:在较低溅射功率密度下,薄膜为无定型结构;随着溅射功率密度升高,沉积薄膜无需 热处理,便呈现出晶态和非晶态的混合相结构,晶态为纳米级的α_Fe(Si)和α_Fe(B)固溶 体;α_Fe(Si)相和α_Fe(B)相的体积分数、微结构组态、磁矩取向及宏观磁性能均随着溅 射功率的变化而变化.

     

    Fe_Si_B_Nb_Cu alloy thin films were deposited by radio frequenc y (rf) magnetro_sputtering. Their microstructures have been analysed by x_ray di ffraction (XRD) and Mssbauer spectrum. The results show that the thin films, p repared by low rf power, are amorphous. With the increase of rf power, the depo sited thin films were turned to be a mixted structure composed of nano_crystals and amorphous matrix. The nano_crystals contain α_Fe(Si) and α_Fe(B) solid solutio ns, which are in nanometer size, their relative volume fractions, atomic assembly features , magnetic moment orientations and macro_magnetic properties are changed under d ifferent rf powers.

     

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