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中国物理学会期刊

掺镁铌酸锂晶体亚微米畴结构特性研究

CSTR: 32037.14.aps.53.4369

Submicron domain patterning in LiNbO3 doped MgO*

CSTR: 32037.14.aps.53.4369
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  • 基于畴背向反转效应,利用外加短脉冲极化电场,通过对脉冲宽度、脉冲间隔以及脉冲个数的有效控制,在掺5mol%镁的铌酸锂晶体上得到周期为1.7μm的均匀亚微米畴结构,其纵向深度为30—50μm.同时,使用脉冲宽度为100ms的宽脉冲信号得到了畴带宽度仅为0.5μm的非对称微畴结构对亚微米畴结构产生的微观机制和物理过程进行了初步探讨.

     

    By using a microsecond pulse field, we succeeded in fabricating a uniform submic ron domain pattern with a period of 1.7μm in LiNbO3- doped 5mol% MgO. And the depth of these domain strips is, typically, about 30 to 50μm. When a pol ed field with a pulse width of 100ms is applied, the domain- inverted structure with a width of 0.5μm was obtained. Using the spontaneous domains backswitc hing and domain side- grown effects, we can explain the mechanism of the submicro n domains evolution.

     

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