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中国物理学会期刊

Ge在Ru(0001)表面上生长及其性质研究

CSTR: 32037.14.aps.54.1330

Growth and characteristics of Ge on Ru(0001)

CSTR: 32037.14.aps.54.1330
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  • 报道Ge在Ru(0001)表面上生长以及相互作用行为的扫描隧道显微镜(STM)和x射线光电子能谱(XPS)研究. STM的实验结果表明Ge在Ru(0001)表面的生长呈典型的Stranski_Krastanov生长模式,Ge的覆盖度小于单原子层时呈层状生长,而从第二层开始呈岛状生长. XPS测量显示衬底Ru(0001)与Ge的相互作用很弱. Ru(0001)表面的Ru 3d5/2和Ru 3d3/2芯态结合能分别处于2798和2840 eV. 随着Ge的生长,到Ge层的厚度为20个单原子层,衬底Ru 3d芯态结合能减小了约02 eV,而Ge 3d芯态结合能从Ge低覆盖度时的289 eV增加到了290 eV,其相对位移约为01 eV.

     

    Scanning tunneling microscopy (STM) and x_ray photoemission spectroscopy (XPS) studies of germanium growth on Ru(0001) were carried out. STM measurements showed a typical Stranski_Krastanov growth mode of Ge on Ru(0001), i.e. first atomic wetting layer is formed in the submololayer range, and the formation of islands on top of a flat first layer occurs for subsequent layers. XPS measurements showed a weak interaction between Ge and the substrate of Ru(0001). The Ru 3d5/2 and Ru 3d3/2 corelevels of Ru(0001) are located at 2798 and 2840 eV in binding energy respectively. Upon Ge growth, up to a thickniss of about 20 atomic layers, the Ru 3d corelevels shift downward in binding energy by an amount of about 02 eV,while the Ge 3d corelevel shift upward in binding energy from the Ge low coverage limit of 289 eV to 290 eV,with a relative change of 01 eV.

     

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