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中国物理学会期刊

离子束溅射法薄膜生长中结瘤微缺陷的生长机理

CSTR: 32037.14.aps.54.1385

Mechanism of nodule growth in ion beam sputtering films

CSTR: 32037.14.aps.54.1385
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  • 用离子束溅射法制备了锆单层薄膜.用设计新型夹具和预置种子方法,对薄膜中结瘤微缺陷的生长过程进行了研究.在高分辨率光学显微镜和扫描电子显微镜下观察发现,结瘤在其生长初期呈现出分形的特征.用分子动力学和薄膜生长的扩散限制聚集模型,薄膜中结瘤微缺陷成核时的分形现象得到了很好的解释.

     

    Zirconium singlelayer films were prepared by ion beam sputtering method. By using a novel designed substrate holder in preplanting seeds method, the growth process of the nodular defects in thin films was studied. With the help of high resolution optical microscopy and electron scanning microcopy, the phenomenon that the nodules nucleation exhibits fractal characters in their initial growth period was observed. By using the molecular dynamics theory and diffusion limited aggregation model of film growth, the fractal phenomenon of the nodule nucleation was well explained.

     

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