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中国物理学会期刊

FTIR研究快中子辐照直拉硅中的VO2

CSTR: 32037.14.aps.54.2256

FTIR study an VO2 defect in fast neutron irradiated Czochralski silicon

CSTR: 32037.14.aps.54.2256
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  • 快中子辐照直拉硅(CZ-Si)经400—450℃热处理后,空位_双氧复合体(VO2)是其 主要 的缺陷.在300—500℃热处理快中子辐照的CZ_Si后,IR光谱中有919.6cm-1和 1006cm-1两个吸收峰伴随VO2(889cm-1)出现,这两个IR吸收 峰是VO2的一种亚稳态缺陷(O-V-O)引起的,此缺陷态是由一个VO(A中心)与次临近的一个 间隙氧原子(Oi)相互作用所形成的.在300℃延长退火时间或升高退火温度,都 会使(O -V-O)转变为稳态VO2.辐照剂量在1019数量级,经400—450℃热处 理所形成的缺陷主要为多空位型,而VO2被抑制.

     

    The vacancy_dioxygen complex(VO2) is one of the main defects formed i n fast neutron irradiated CZ_Si during annealing in the temperature range 400—500℃. In this defect,two oxygen atoms share a vacancy,each of which is bonded to two s ilicon neighbors.With the increase of the 889cm-1(VO2),two infrared absorption bands at 919.6 and 1006cm-1 will arise in neutron irradia ted CZ _Si after annealed in the temperature range 300—500℃.IR vibrational bands at 9 19.6 and 1006cm-1 can be assigned to the metastable defect (O-V-O)th at is composed of a VO(A center) and a neighboring interstitial oxygen(Oi)atom.By prolonging the annealing time from 2h up to 10h or increasing the annealing temperature,the metastable defect(O-V-O)will be converted into V O2.During annealing in the temperature range 400—500℃,the main defe cts for med in the high dose(1019) neutron irradiated CZ_Si is the multi_vac ancy type of defects and the formation of the VO2 will be depressed.

     

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