Nano-sized graphite patterns were obtained by tailoring graphite sheets using different methods. With focused ion beam etching we are able to produce grooves of minimum width ～ 30 nm. However, at the edges of the grooves there deposit with Ga-C compound which prevents the easy cleavage of the graphite sheets. With electron beam lithography and reactive ion etching techniques we are able to produce graphite patterns of sizes down to 50 nm. Three different types of masks are tested, and the results are compared and discussed.