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中国物理学会期刊

GaAs/Ga1-xAlxAs半导体量子阱光辐射-热离子制冷

CSTR: 32037.14.aps.54.4345

Opto-thermionic refrigeration of semiconductor heterostructure

CSTR: 32037.14.aps.54.4345
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  • 采用数值计算方法分析了GaAs/Ga1-xAlxAs 半导体量子阱的光 辐射-热离子制冷. 以漂移-扩散模型为基础,通过电流连续性方程和泊松方程自洽地计算出在外加正向偏压的 条件下半导体内部的载流子分布情况,并在此基础上计算了阱内载流子的发光复合和俄歇复 合,从而确定了半导体异质结量子阱光辐射-热离子制冷的最优条件.进一步分析了不同Al组 分的Ga1-xAlxAs材料以及不同的掺杂浓度对制冷效果的影响, 为该领域的实验工作提供了极有价值的参考.

     

    Numerical method has been used to analyze the opto-thermionic refrigeration proc ess of semiconductor heterostructure. Based on the drift-diffusion model, curren t continuity equation and Poisson equation are employed to calculate the distrib ution of carriers, the radiative recombination rate and the Auger recombination rate of the semiconductor. In addition, we have calculated the effect of the cha nging of barrier height and the doping density on the refrigeration rate. Thus t he optimum conditions of opto-thermionic refrigeration have been obtained based on these results. This work is of great significance for guiding the experiment research in the future.

     

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