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中国物理学会期刊

带隙法测定SiGe/Si材料的应变状态

CSTR: 32037.14.aps.54.4350

A method to estimate the strain state of SiGe/Si by measuring the bandgap

CSTR: 32037.14.aps.54.4350
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  • 从固体模型理论的结果出发,计算了生长于Si(100)衬底上x值小于085的Si1-xGex合金材料(能带结构为类Si结构)的间接带隙与应变的关系,结 果表明,应变的S iGe材料的带隙和完全弛豫状态下材料的带隙之差与应变呈线性关系.基于这一结果,提出了 用测量带隙来间接测定SiGe/Si应变状态的方法.用带隙法和x射线双晶衍射法测量了不同应 变状态下的SiGe/Si多量子阱材料的应变弛豫度,两者可以较好的符合,表明带隙法测量SiG e应变弛豫度是可行的.

     

    Using the result of model-solid theory,we have obtained the relationship between bandgap and strain of Si1-xGex alloy on Si(100) subs trate with x<085 . It was shown that the deviation between the bandgap of strained SiGe and relax ed SiGe is proportional to the strain. According to the theoretical result, a no vel method was suggested to determine the strain state of SiGe/Si through measur ing the bandgap. The strain in the SiGe/Si multi-quantum wells was measured using the new method and the results had good agreement with that from XRD measurement.

     

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