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中国物理学会期刊

B0.44C0.27N0.29化合物的合成、表征和性能

CSTR: 32037.14.aps.54.4627

Synthesis, characterization and properties of B0.44C0.27N0.29 compound

CSTR: 32037.14.aps.54.4627
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  • 以硼酸和三聚氰胺为原料,利用化学法、真空热处理及高温高压技术对BCN化合物的形成、结构及相变进行了研究. 在真空10-3Pa条件下,经1273K高温热处理得到非晶B-C-N前驱物. 这种前驱物在920K以下为绝缘体,在920K由绝缘体转变为非晶半导体. 在973—1003K和1013—1073K范围这种非晶半导体表现出不同的电导-温度关系,电导激活能分别为0.34eV和1.10eV,表明在两个不同的温度区域这种非晶半导体的导电机构不同. 将这种前驱物在3.5GPa,经1473K退火40min后由非晶态转化为单相六方结构的B-C-N晶体,其成分为B0.44C0.27N0.29,晶格常数为a=0.2515nm,c=0.6684nm. 六方B0.44C0.27N0.29晶体在1330,1364,1588和1617cm-1出现四个强的Raman散射峰,其中1330和1617cm-1被认为是六方B0.44C0.27N0.29晶体特征Raman散射峰.

     

    B-C-N compounds with different structures were synthesized by chemical reaction between Boracic acid and melamine, combined with heat treatment under vacuum and high pressure. An amorphous B-C-N precursor was prepared at 1273K under 10-3Pa. This amorphous B-C-N behaves as an insulator below 920K, and transforms into semiconductor above 920K. The B-C-N semiconductor shows different conductivity-temperature relationship in the temperature ranges of 973—1003K and 1013—1073K, and has conductivity activation energy of 0.34eV in the former range and 1.10eV in the latter range, indicating that conductivity mechanism of the B-C-N amorphous semiconductor is different in the two temperature ranges. Annealed for 40min. at 1473K under 3.5GPa, the amorphous B-C-N precursor crystallizes into hexagonal B0.44C0.27N0.29(h-BCN) compound with lattice constants of a=0.2515nm and c=0.6684nm. Four strong Raman scattering peaks were observed at 1330,1364,1588 and 1617cm-1 in the h-BCN, of which the peaks located at 1330 and 1617cm-1 are considered as characteristic Raman peaks of the h-BCN.

     

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