Microcrystalline silicon thin films used for solar cells were deposited at different silane concentrations and reaction pressures by VHF-PECVD.Study of materials structure was conducted by Raman spectra and x-ray diffraction. In the range of experiment, microcrystalline silicon thin films prepared under different cond itions all have (220) preferential orientation. Microcrystalline silicon solar c ells with conversion efficiency up to 7.1% were fabricated. The structure of sol ar cells was glass/ZnO/p(μc-Si:H)/i(μc-Si:H)/n(a-Si:H/Al). There was no Zno ba ck reflector and the thickness of solar cells was only 1.2μm.