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中国物理学会期刊

原子力显微镜与x射线光电子能谱对LiBq4/ITO和LiBq4/CuPc/ITO的表面分析

CSTR: 32037.14.aps.54.5717

Surface analysis of LiBq4/ITO and LiBq4/CuPc/ITO using atomic force microscopy and x-ray photoelectron spectroscopy

CSTR: 32037.14.aps.54.5717
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  • 利用原子力显微镜对8-羟基喹啉硼化锂(LiBq4)/铟锡氧化物和8-羟基喹啉硼化锂/酞菁铜(CuPc)/铟锡氧化物表面分别进行了扫描,显示了LiBq4在不同衬底上的形貌差异,并进一步利用样品表面的x射线光电子能谱图验证了这一差异.实验表明,CuPc层的加入改善了LiBq4的成膜质量,并将这种改善归因于分子构型与电子亲和势的不同.

     

    We have investigated the surfaces of the samples LiBq4/ITO and LiBq4/CuPc/ITO. The atomic force microscopy (AFM) observations indicate that different surface morphologies are formed on different substrates, and what is more, x-ray photoelectron spectroscopy is also utilized to further demonstrate the AFM results. It is concluded that the introduction of a CuPc buffer layer under the LiBq4 layer can improve the film quality of LiBq4, and the improvement should be attributed to the differences in molecular structure and electron affinity.

     

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