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中国物理学会期刊

渐变掩蔽图形超低压选择区域生长法制备高质量InGaAsP多量子阱材料

CSTR: 32037.14.aps.55.2982

High-quality multiple quantum wells selectively grown on taper-patterned substrates by ultra-low-pressure MOCVD

CSTR: 32037.14.aps.55.2982
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  • 采用超低压(22 mbar)选择区域生长(Selective Area Growth, SAG)金属有机化学汽相沉积(Metal-organic Chemical Vapor Deposition, MOCVD)技术成功制备了高质量InGaAsP/InGaAsP多量子阱(Multiple Quantum Well, MQW)材料. 在较小的掩蔽宽度变化范围内(15—30μm),得到了46nm的光荧光(Photoluminescence, PL)波长偏移量,PL半高宽(Full-Width-at-Half-

     

    High quality InGaAsP/InGaAsP multiple quantum wells (MQWs) have been selectively grown by ultra-low-pressure (22 mbar) metal-organic chemical vapor deposition. A large bandgap energy shift of 46 nm and photoluminescence with FWHM less than 30 meV were obtained with a rather small mask width variation (15—30 μm). In order to study the uniformity of the MQWs grown in the selective area, novel tapered masks were employed, and the transition effect of the tapered region was also studied. The energy detuning of the tapered region was observed to be saturated at larger ratios of the mask width to the tapered region length.

     

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