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中国物理学会期刊

(111)择优取向的Pb(Zr0.52Ti0.48)O3铁电薄膜的制备及研究

CSTR: 32037.14.aps.55.3067

Improved dielectric and ferroelectric characteristics of highly (111)-oriented Pb(Zr0.52Ti0.48)O3 films produced by sol-gel method

CSTR: 32037.14.aps.55.3067
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  • 选用不同浓度的Pb(Zr0.52Ti0.48)O3溶胶,用Sol-gel法在Pt/Ti/SiO2/Si基片上沉积一层厚度不同的Pb(Zr0.52Ti0.48)O3 (PZT52)过渡层,经400℃烘烤、550℃退火等程序后,再用Sol-gel法在PZT52过渡层上沉积Pb(Zr0.52Ti0.48)O

     

    Highly (111)-oriented Pb(Zr0.52Ti0.48)O3 (PZT) films with a variety of PZT buffer layer thickness were prepared by spin coating on Pt/Ti/SiO2/Si substrates with Sol-Gel process. The thickness of PZT buffer layer was found to play a significant role on grain size and orientation of Pb(Zr0.52Ti0.48)O3 films. With the increasing of PZT buffer layer thickness, both crystallization and orientation were improved obviously. High dielectric constant (1278, 1kHz, for 28nm buffer), low dielectric loss (0.023, 1kHz, for 28nm buffer), symmetric C-V characteristics and P-E curves were obtained. Hysteresis measurements show that the remnant polarization and coercive field of the films reach 43μC·cm-2 and 78kV·cm-1, respectively.

     

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