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中国物理学会期刊

InP基HEMT器件中二维电子气浓度及分布与沟道层厚度关系的理论分析

CSTR: 32037.14.aps.55.3677

Theoretical analysis about the influence of channel layer thickness on the 2D electron gas and its distribution in InP-based high-electron-mobility transistors

CSTR: 32037.14.aps.55.3677
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  • 利用数值计算的方法研究了InP基高电子迁移率晶体管(HEMT)中沟道厚度对沟道中二维电子气(2DEG)性质的影响,并对产生这种影响的原因进行了深入探讨.计算结果表明,当沟道层厚度从10nm增加到40nm时,沟道中2DEG的密度几乎没有变化,但激发态和基态上的电子密度之比(R)先增加后减小.当沟道层厚度在20—25nm之间时,R达到最大.此结果可作为优化器件结构设计的依据.

     

    The principle of high-electron-mobility transistor (HEMT) and the property of two-dimensional electron gas (2DEG) have been analyzed theoretically. The concentration and distribution of 2DEG in various channel layers are calculated by numerical method. Variation of 2DEG concentration in different subband of the quantum well is discussed in detail. Calculated results show that sheet electron concentration of 2DEG in the channel is affected slightly by the thickness of the channel. But the proportion of electrons inhabited in different subbands can be affected by the thickness of the channel. When the size of channel lies between 20—25 nm, the number of electrons occupying the second subband reaches the maximum. This result can be used in parameter design of materials and devices.

     

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