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中国物理学会期刊

尺寸可控的纳米硅的生长模型和实验验证

CSTR: 32037.14.aps.55.5403

The growth model and experimental validation of size-controlled nanocrystalline silicon

CSTR: 32037.14.aps.55.5403
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  • 基于经典热力学理论,对a-SiNx/a-Si:H/a-SiNx三明治结构或a-Si:H/a-SiNx多层膜结构中纳米硅成核,以及从球形到鼓形的生长过程进行了研究. 建立了限制性晶化理论模型:在纳米硅生长过程中,由于界面能增大将导致生长停止,给出限制性晶化条件——a-Si:H子层厚度小于34 nm. 在激光晶化和常规热退火两种方法形成的a-SiNx/nc-Si/a-SiNx三明治结构和nc-Si/a-SiNx多层膜结构中验证了该理论模型.

     

    According to the processes of nucleation and growth of nanocrystalline silicon (nc-Si) with shape changing from sphere-like to disc-like in the a-SiNx/a-Si:H/a-SiNx sandwich structure or a-Si :H/a-SiNx multilayer structure, we have proposed the theoretical model of constrained crystallinzation based on the classical thermodynamics, in which the increase of the interfacial energy between nc-Si and a-SiNx causes the growth of nc-Si to halt, and concludes the critical thickness of a-Si sublayer (34 nm) for constrained crystallization, The model of constrained growth has been validated in a-SiNx/nc-Si/a-SiNx sandwich and nc-Si/a-SiNx multilayer structures formed by laser annealing and thermal annealing.

     

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